Company Filing History:
Years Active: 2010
Title: Innovations of Percy Van Crocker in Photomask Repair
Introduction
Percy Van Crocker is an accomplished inventor based in Chicago, IL. He has made significant contributions to the field of nanotechnology, particularly in the area of photomask repair. His innovative approaches have paved the way for advancements in the fabrication of phase shift masks.
Latest Patents
Percy Van Crocker holds a patent for "Methods for additive repair of phase shift masks by selectively depositing nanometer-scale engineered structures on defective phase shifters." This patent focuses on photomask repair and fabrication using direct-write nanolithography. It includes the use of scanning probe microscopic tips, such as atomic force microscope tips, for the deposition of ink materials, including sol-gel inks. The additive methods he developed can be combined with subtractive methods, allowing for the filling of holes with nanostructures. Notably, the heights of these nanostructures can be controlled without compromising their lateral dimensions. The phase shifters on phase shifting masks (PSMs) are repaired additively with selectively deposited sol-gel material, which is converted to solid oxide. This solid oxide possesses optical transparency and an index of refraction that is adapted for the repaired phase shifters.
Career Highlights
Percy Van Crocker is currently associated with Nanoink, Inc., where he continues to innovate in the field of nanotechnology. His work has garnered attention for its potential applications in various industries, particularly in semiconductor manufacturing.
Collaborations
Throughout his career, Percy has collaborated with notable colleagues, including Sylvain Cruchon-Dupeyrat and Linette Demers. These collaborations have further enhanced the impact of his work in the field.
Conclusion
Percy Van Crocker's contributions to photomask repair through innovative nanotechnology methods highlight his role as a leading inventor in this specialized area. His patent reflects a significant advancement in the field, showcasing the potential for future developments in nanolithography and semiconductor fabrication.