The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Apr. 07, 2006
Sylvain Cruchon-dupeyrat, Chicago, IL (US);
Michael Nelson, Libertyville, IL (US);
Robert Elghanian, Wilmette, IL (US);
Joseph S. Fragala, San Jose, CA (US);
Igor Touzov, Cary, NC (US);
Debjyoti Banerjee, Fremont, CA (US);
Sylvain Cruchon-Dupeyrat, Chicago, IL (US);
Michael Nelson, Libertyville, IL (US);
Robert Elghanian, Wilmette, IL (US);
Joseph S. Fragala, San Jose, CA (US);
Igor Touzov, Cary, NC (US);
Debjyoti Banerjee, Fremont, CA (US);
NanoInk, Inc., Chicago, IL (US);
Abstract
Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.