The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Feb. 25, 2005
Sylvain Cruchon-dupeyrat, Chicago, IL (US);
Hua Zhang, Evanston, IL (US);
Robert Elghanian, Chicago, IL (US);
Linette Demers, Evanston, IL (US);
Nabil Amro, Chicago, IL (US);
Sandeep Disawal, Chicago, IL (US);
John Bussan, Naperville, IL (US);
Sylvain Cruchon-Dupeyrat, Chicago, IL (US);
Hua Zhang, Evanston, IL (US);
Robert Elghanian, Chicago, IL (US);
Linette Demers, Evanston, IL (US);
Nabil Amro, Chicago, IL (US);
Sandeep Disawal, Chicago, IL (US);
John Bussan, Naperville, IL (US);
Nanoink, Inc., Skokie, IL (US);
Abstract
A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material.