The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
May. 13, 2009
John Edward Bussan, Naperville, IL (US);
Michael R. Nelson, Libertyville, IL (US);
Joseph S. Fragala, San Jose, CA (US);
Albert K. Henning, Palo Alto, CA (US);
Jeffrey R. Rendlen, Glen Ellyn, IL (US);
John Edward Bussan, Naperville, IL (US);
Michael R. Nelson, Libertyville, IL (US);
Joseph S. Fragala, San Jose, CA (US);
Albert K. Henning, Palo Alto, CA (US);
Jeffrey R. Rendlen, Glen Ellyn, IL (US);
NanoInk, Inc., Skokie, IL (US);
Abstract
Devices for performing nanofabrication are provided which provide small volume reaction space and high reaction versatility. A device may include a reaction chamber adapted for nanoscale modification of a substrate and vacuum conditions; a scanning probe tip assembly enclosed within the reaction chamber; a first port coupled to the reaction chamber for delivering a gas; a second port coupled to the reaction chamber for applying a vacuum; and a substrate assembly insertedly mounted to the reaction chamber. The reaction chamber may include a body having one or more flexible walls and one or more supports to prevent the reaction chamber from collapsing under a vacuum. The device may further include an electrical conduit for coupling the tips of the scanning probe tip assembly to electrical components outside the reaction chamber. Also provided are apparatuses incorporating the devices and methods of using the devices and apparatuses.