Company Filing History:
Years Active: 2012
Title: The Innovative Contributions of Jeffrey R. Rendlen
Introduction
Jeffrey R. Rendlen is a notable inventor based in Glen Ellyn, IL (US), recognized for his significant contributions to the field of nanotechnology. With a total of 2 patents, he has developed innovative solutions that enhance the capabilities of nanofabrication and scanning probe lithography.
Latest Patents
Rendlen's latest patents include advancements in active pen nanolithography and nanomanufacturing devices. The first patent focuses on improved actuated probes suitable for scanning probe lithography or microscopy, particularly in direct-write nanolithography. This invention features thermomechanically actuated cantilevers with oxide-sharpened microcast tips, which are fabricated through low-temperature wafer bonding techniques. Additionally, it introduces a flexcircuit that connects the actuated probes to external circuitry, facilitating the development of enhanced scanning probe lithography instruments. The second patent presents devices for performing nanofabrication, which provide small volume reaction spaces and high reaction versatility. This device includes a reaction chamber designed for nanoscale modification of substrates under vacuum conditions, along with a scanning probe tip assembly and various ports for gas delivery and vacuum application.
Career Highlights
Throughout his career, Jeffrey R. Rendlen has worked with prominent companies in the nanotechnology sector, including Nanolnk, Inc. and Nanoink, Inc. His work has significantly impacted the development of nanofabrication techniques and instruments.
Collaborations
Rendlen has collaborated with notable individuals in the field, including John Edward Bussan and Joseph S. Fragala. These partnerships have contributed to the advancement of his innovative projects and patents.
Conclusion
Jeffrey R. Rendlen's contributions to nanotechnology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in nanofabrication and scanning probe lithography.