The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2011

Filed:

Sep. 10, 2007
Applicants:

Raymond K. Eby, Grayslake, IL (US);

Michael Nelson, Libertyville, IL (US);

Igor Touzov, Cary, NC (US);

Inventors:

Raymond K. Eby, Grayslake, IL (US);

Michael Nelson, Libertyville, IL (US);

Igor Touzov, Cary, NC (US);

Assignee:

Nanoink, Inc., Skokie, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); B05D 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.


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