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Longmont, CO, United States of America

Matheson Tri-Gas, Inc.

USPTO Granted Patents = 53

% Expired Patents = 52.8

EPO Patents = 1

Trademarks = 25

Forward Citations = 363

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47 inventors (with patents filed for the assignee):

Robert Torres, Jr (23 out of 24 patents)

Tadaharu Watanabe (16 out of 16 patents)

Joseph V Vininski (16 out of 17 patents)

4. Dan Fraenkel (15 out of 20 patents)

5. Carrie L Wyse (10 out of 13 patents)

6. Hans Heinrich Funke (10 out of 14 patents)

7. Virginia H Houlding (9 out of 9 patents)

8. Mark Raynor (8 out of 8 patents)

9. Daniel Tempel (4 out of 4 patents)

10. Hong He (3 out of 148 patents)

11. Junpin Yao (3 out of 3 patents)

12. Larry Wagg (3 out of 3 patents)

13. Adam Seymour (3 out of 3 patents)

14. Paul D Brabant (3 out of 3 patents)

15. Devendra K Sadana (3 out of 832 patents)

Core Competencies:

Gas Purification

Moisture Control

Reactive Fluids

Fluid Storage

High Purity Fluid

Epitaxy

Hydride Gases

Laser Gas Mixtures

OLED Devices

Toxic Gases

Trace Impurities

Carbon Materials

53 patents: Sort by Forward Citations

1. 12326223 - Getter cartridge for toxic gases inside valves (2025-06-10),

2. 12305292 - Use of reactive fluids in additive manufacturing and the products made therefrom (2025-05-20),

3. 11027974 - Removal of moisture from hydrazine (2021-06-08),

4. 10103507 - System for reclaiming, rebalancing and recirculating laser gas mixtures used in a high energy laser system (2018-10-16),

5. 10010853 - Reduction of SiCl4 in the presence of BCl3 (2018-07-03),

6. 9669378 - Reduction of SiCl4 in the presence of BCl3 (2017-06-06),

7. 9218962 - Low temperature epitaxy of a semiconductor alloy including silicon and germanium employing a high order silane precursor (2015-12-22),

8. 8932406 - In-situ generation of the molecular etcher carbonyl fluoride or any of its variants and its use (2015-01-13),

9. 8759200 - Methods and apparatus for selective epitaxy of Si-containing materials and substitutionally doped crystalline Si-containing material (2014-06-24),

10. 8642454 - Low temperature selective epitaxy of silicon germanium alloys employing cyclic deposit and etch (2014-02-04),

11. 8623148 - [object Object] (2014-01-07),

12. 8535423 - Removal of impurities from hydrogen-containing materials (2013-09-17),

13. 8268046 - Removal of impurities from hydrogen-containing materials (2012-09-18),

14. 8182589 - Acetylene process gas purification methods and systems (2012-05-22),

15. 8142549 - Purification of fluorine containing gases and systems and materials thereof (2012-03-27),

Company Overview

Matheson Tri-Gas, Inc. specializes in gas purification technology, focusing on the development and manufacturing of high-purity gases and associated equipment. The company is recognized for its expertise in moisture control, reactive fluids, and fluid storage solutions, catering to industries that require stringent gas quality standards. With a strong emphasis on epitaxy and hydride gases, Matheson Tri-Gas supports various applications, including semiconductor manufacturing and laser technologies, primarily serving clients in the United States and beyond.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

53 Patents

#10 in Longmont, CO

#132 in Colorado

#6,672 in US

#13,348 in the World

Longmont, CO, United States of America

Matheson Tri-Gas, Inc.

Forward Citations = 363

47 inventors:

Robert Torres, Jr (23 out of 24 patents)

Tadaharu Watanabe (16 out of 16 patents)

Joseph V Vininski (16 out of 17 patents)

4. Dan Fraenkel (15 out of 20 patents)

5. Carrie L Wyse (10 out of 13 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Matheson Tri-Gas, Inc.. Retrieved from https://idiyas.com/company/matheson-tri-gas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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