The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Nov. 08, 2017
Applicant:
Matheson Tri-gas, Inc., Basking Ridge, NJ (US);
Inventors:
Hideharu Shimizu, Longmont, CO (US);
Mark Raynor, Longmont, CO (US);
Daniel Tempel, Erie, CO (US);
Robin Gardiner, Longmont, CO (US);
Daniel Alvarez, Jr., Oceanside, CA (US);
Assignee:
Matheson Tri-Gas, Inc., Basking Ridge, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/26 (2006.01); C01B 21/16 (2006.01); B01D 53/28 (2006.01); B01J 20/04 (2006.01); B01J 20/08 (2006.01); B01J 20/10 (2006.01); B01J 20/26 (2006.01); B01J 20/28 (2006.01); B01J 20/282 (2006.01); B01J 20/283 (2006.01); B01J 20/284 (2006.01); B01J 20/285 (2006.01);
U.S. Cl.
CPC ...
C01B 21/16 (2013.01); B01D 53/261 (2013.01); B01D 53/263 (2013.01); B01D 53/28 (2013.01); B01J 20/04 (2013.01); B01J 20/041 (2013.01); B01J 20/08 (2013.01); B01J 20/103 (2013.01); B01J 20/26 (2013.01); B01J 20/282 (2013.01); B01J 20/283 (2013.01); B01J 20/284 (2013.01); B01J 20/285 (2013.01); B01J 20/28061 (2013.01); B01J 20/28064 (2013.01); B01J 20/28071 (2013.01); B01J 20/28073 (2013.01); B01J 20/28076 (2013.01); B01D 2251/30 (2013.01); B01D 2251/302 (2013.01); B01D 2251/304 (2013.01); B01D 2251/306 (2013.01); B01D 2251/402 (2013.01); B01D 2251/404 (2013.01); B01D 2251/406 (2013.01); B01D 2251/408 (2013.01); B01D 2252/30 (2013.01); B01D 2253/104 (2013.01); B01D 2253/106 (2013.01); B01D 2253/1085 (2013.01); B01D 2253/112 (2013.01); B01D 2253/1122 (2013.01); B01D 2253/1124 (2013.01); B01D 2253/306 (2013.01); B01D 2253/311 (2013.01); B01D 2256/00 (2013.01); B01J 2220/52 (2013.01); C01P 2006/82 (2013.01);
Abstract
The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).