The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Sep. 09, 2010
Glenn Mitchell, Longmont, CO (US);
Robert Torres, Jr., Parker, CO (US);
Adam Seymour, Longmont, CO (US);
Glenn Mitchell, Longmont, CO (US);
Robert Torres, Jr., Parker, CO (US);
Adam Seymour, Longmont, CO (US);
Matheson Tri-Gas, Inc., Basking Ridge, NJ (US);
Abstract
Methods of cleaning a processing chamber with nitrogen trifluoride (NF) are described. The methods involve a concurrent introduction of nitrogen trifluoride and a reactive diluent into the chamber. The NFmay be excited in a plasma inside the chamber or in a remote plasma region upstream from the chamber. The reactive diluent may be introduced upstream or downstream of the remote plasma such that both NFand the reactive diluent (and any plasma-generated effluents) are present in the chamber during cleaning. The presence of the reactive diluent enhances the chamber-cleaning effectiveness of the NF.