Glenn Mitchell

Title: Innovations of Glenn Mitchell in Molecular Etching

Introduction

Glenn Mitchell is an accomplished inventor based in Longmont, Colorado. He has made significant contributions to the field of molecular etching, holding two patents that enhance the efficiency of cleaning and etching processes in chemical deposition chambers.

Latest Patents

Mitchell's latest patents include the in-situ generation of the molecular etcher carbonyl fluoride (COF) and methods for cleaning processing chambers with nitrogen trifluoride (NF). The first patent focuses on increasing the efficiency of etching and cleaning unwanted materials in process chambers. It involves igniting and sustaining a plasma through the stepwise addition of additives, such as perfluorocarbon compounds and carbon oxides, into a nitrogen trifluoride plasma. The second patent describes methods for cleaning a processing chamber by concurrently introducing nitrogen trifluoride and a reactive diluent, enhancing the cleaning effectiveness of NF.

Career Highlights

Glenn Mitchell works at Matheson Tri-Gas, Inc., where he applies his expertise in molecular etching technologies. His innovative approaches have contributed to advancements in the semiconductor manufacturing industry.

Collaborations

Mitchell collaborates with notable colleagues, including Robert Torres, Jr. and Adam Seymour, to further develop and refine his inventions.

Conclusion

Glenn Mitchell's work in molecular etching and cleaning processes showcases his innovative spirit and dedication to advancing technology in the semiconductor field. His patents reflect a commitment to improving efficiency and effectiveness in chemical deposition chambers.