IDiyas

For the Inventor, By the Inventor

Mesa, AZ, United States of America

Fujifilm Planar Solutions, LLC


USPTO Granted Patents = 16


Forward Citations = 41

Loading Chart...
Loading Chart...

22 inventors (with patents filed for the assignee):

goldMedal Deepak Mahulikar (13 out of 82 patents)

silverMedal Bin Hu (6 out of 20 patents)

bronzeMedal Abhudaya Mishra (6 out of 20 patents)

4.  Richard Wen (6 out of 7 patents)

5.  Luling Wang (5 out of 6 patents)

6.  Saeed H Mohseni (3 out of 5 patents)

7.  Hyungjun Kim (3 out of 6 patents)

8.  Minae Tanaka (3 out of 3 patents)

9.  Liqing Wen (2 out of 10 patents)

10.  James McDonough (2 out of 7 patents)

11.  Laura John (2 out of 3 patents)

12.  Yuhu Wang (2 out of 2 patents)

13.  Ken A Delbridge (2 out of 2 patents)

14.  Gert R M Moyaerts (2 out of 2 patents)

15.  Nichole R Koontz (2 out of 2 patents)


16 patents:

1. 10167415 - Reduction in large particle counts in polishing slurries (2019-01-01),
2. 10159949 - Advanced fluid processing methods and systems (2018-12-25),
3. 10106705 - Polishing compositions and methods of use thereof (2018-10-23),
4. 9914852 - Reduction in large particle counts in polishing slurries (2018-03-13),
5. 9735031 - Polishing compositions and methods for polishing cobalt films (2017-08-15),
6. 9735030 - Polishing compositions and methods for polishing cobalt films (2017-08-15),
7. 9583359 - Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films (2017-02-28),
8. 9558959 - Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films (2017-01-31),
9. 9556371 - Homogeneous blending (2017-01-31),
10. 9190286 - Composition for advanced node front-and-back-end of line chemical mechanical polishing (2015-11-17),
11. 8779011 - Ultrapure colloidal silica for use in chemical mechanical polishing applications (2014-07-15),
12. 8771540 - Highly dilutable polishing concentrates and slurries (2014-07-08),
13. 8742130 - Hydrate forms of 1,2,4-triazole, processes for manufacture thereof, and compositions thereof (2014-06-03),
14. 8404143 - Highly dilutable polishing concentrates and slurries (2013-03-26),
15. 8211193 - Ultrapure colloidal silica for use in chemical mechanical polishing applications (2012-07-03),
FUJIFILM PLANAR SOLUTIONS, LLC is a leading provider of planarization solutions for the semiconductor industry. With extensive expertise in chemical mechanical planarization (CMP), the company offers innovative products and technologies that enable high-precision polishing and surface planarization of semiconductor wafers. FUJIFILM PLANAR SOLUTIONS is committed to delivering advanced solutions that enhance the performance and yield of semiconductor devices, ensuring optimal manufacturing processes for its global customers.
This text is generated by artificial intelligence and may not be accurate.

logo

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

16 Patents

#12 in Mesa, AZ

#240 in Arizona

#19,271 in US

#36,634 in the World

...
Mesa, AZ, United States of America

Fujifilm Planar Solutions, LLC

Forward Citations = 41

22 inventors:

goldMedal Deepak Mahulikar (13 out of 82 patents)

silverMedal Bin Hu (6 out of 20 patents)

bronzeMedal Abhudaya Mishra (6 out of 20 patents)

4.  Richard Wen (6 out of 7 patents)

5.  Luling Wang (5 out of 6 patents)

Please report any incorrect information to support@idiyas.com
Loading…