For the Inventor, By the Inventor

Enter assignee name

Mesa, AZ, United States of America

Fujifilm Planar Solutions, LLC

USPTO Granted Patents = 16

% Expired Patents = 6.3

EPO Patents = 2

Forward Citations = 42

Loading Chart...

Loading Chart...

22 inventors (with patents filed for the assignee):

Deepak Mahulikar (13 out of 82 patents)

Bin Hu (6 out of 24 patents)

Abhudaya Mishra (6 out of 20 patents)

4. Richard Wen (6 out of 7 patents)

5. Luling Wang (5 out of 6 patents)

6. Saeed H Mohseni (3 out of 5 patents)

7. Hyungjun Kim (3 out of 6 patents)

8. Minae Tanaka (3 out of 3 patents)

9. Liqing Wen (2 out of 10 patents)

10. James McDonough (2 out of 8 patents)

11. Laura John (2 out of 3 patents)

12. Yuhu Wang (2 out of 2 patents)

13. Ken A Delbridge (2 out of 2 patents)

14. Gert R M Moyaerts (2 out of 2 patents)

15. Nichole R Koontz (2 out of 2 patents)

16 patents: Sort by Forward Citations

1. 10167415 - Reduction in large particle counts in polishing slurries (2019-01-01),

2. 10159949 - Advanced fluid processing methods and systems (2018-12-25),

3. 10106705 - Polishing compositions and methods of use thereof (2018-10-23),

4. 9914852 - Reduction in large particle counts in polishing slurries (2018-03-13),

5. 9735031 - Polishing compositions and methods for polishing cobalt films (2017-08-15),

6. 9735030 - Polishing compositions and methods for polishing cobalt films (2017-08-15),

7. 9583359 - Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films (2017-02-28),

8. 9558959 - Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films (2017-01-31),

9. 9556371 - Homogeneous blending (2017-01-31),

10. 9190286 - Composition for advanced node front-and-back-end of line chemical mechanical polishing (2015-11-17),

11. 8779011 - Ultrapure colloidal silica for use in chemical mechanical polishing applications (2014-07-15),

12. 8771540 - Highly dilutable polishing concentrates and slurries (2014-07-08),

13. 8742130 - Hydrate forms of 1,2,4-triazole, processes for manufacture thereof, and compositions thereof (2014-06-03),

14. 8404143 - Highly dilutable polishing concentrates and slurries (2013-03-26),

15. 8211193 - Ultrapure colloidal silica for use in chemical mechanical polishing applications (2012-07-03),

Company Overview

Fujifilm Planar Solutions, LLC, based in Mesa, AZ, specializes in advanced imaging and material technologies. The company focuses on developing innovative solutions for various applications, including medical imaging and industrial inspection. With a commitment to research and development, Fujifilm Planar Solutions leverages its expertise in imaging science to enhance product performance and reliability across multiple sectors. The organization is part of the broader Fujifilm Corporation, known for its contributions to imaging and information technology globally.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

16 Patents

#14 in Mesa, AZ

#237 in Arizona

#19,922 in US

#37,831 in the World

Mesa, AZ, United States of America

Fujifilm Planar Solutions, LLC

Forward Citations = 42

22 inventors:

Deepak Mahulikar (13 out of 82 patents)

Bin Hu (6 out of 24 patents)

Abhudaya Mishra (6 out of 20 patents)

4. Richard Wen (6 out of 7 patents)

5. Luling Wang (5 out of 6 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Fujifilm Planar Solutions, LLC. Retrieved from https://idiyas.com/company/fujifilm-planar-solutions

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

Loading…