Ken A Delbridge

Title: Ken A. Delbridge - Innovator in Ultrapure Colloidal Silica Technology

Introduction

Ken A. Delbridge, an accomplished inventor based in Chandler, AZ, has made significant contributions to the field of chemical mechanical polishing applications. With two patents to his name, his work focuses on enhancing the purity and effectiveness of colloidal silica, a vital component in various industrial processes.

Latest Patents

Delbridge's latest inventions include a method for producing ultrapure colloidal silica, which is crucial for chemical mechanical polishing. This innovative process outlines the steps for creating a colloidal silica dispersion with stringent purity requirements, ensuring that there are less than 200 parts per billion (ppb) of trace metal impurities and less than 2 parts per million (ppm) of residual alcohol. The method involves dissolving fumed silica in an aqueous solvent and manipulating temperature, concentration, and pH to foster nucleation and particle growth, ultimately resulting in a high-quality colloidal silica dispersion.

Additionally, Delbridge has developed a method for using ultrapure colloidal silica in chemical mechanical polishing of substrate surfaces. This involves contacting a substrate with a composition of colloidal silica particles, which are equally characterized by low impurity levels. The process ensures effective planarization, making it invaluable for industries requiring precision in surface finishing.

Career Highlights

Currently, Delbridge is associated with Fujifilm Planar Solutions, LLC, where his expertise in chemical applications and material science is pivotal. His role involves not just innovation but also the practical application of his patented methods in high-tech industries.

Collaborations

Delbridge collaborates with notable professionals in his field, including Deepak Mahulikar and Yuhu Wang. Together, they contribute to the advancement of technologies that enhance manufacturing processes and improve product quality in the semiconductor and electronics industries.

Conclusion

Ken A. Delbridge exemplifies the spirit of innovation in the pursuit of advanced materials technology. His work in developing ultrapure colloidal silica significantly impacts the efficiency and effectiveness of chemical mechanical polishing applications, paving the way for future advancements in the semiconductor sector. Delbridge's contributions reaffirm the importance of ongoing research and collaboration in enhancing industrial processes through innovation.