Mesa, AZ, United States of America

Liqing Wen

This inventor holds 10 USPTO granted patents and 3 published patent applications and 5 EPO patents. Top assignees: Fujifilm Electronic Materials U.s.a., Inc., Fujifilm Planar Solutions, LLC. Active years: 2012-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Liqing Wen. Retrieved from https://idiyas.com/inventor/liqing-wen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.8

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2012-2025

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10 patents (USPTO):Explore Patents

Title: The Innovative Journey of Liqing Wen: A Patented Trailblazer in Polishing Compositions

Introduction

Liqing Wen is an accomplished inventor based in Mesa, AZ, with a remarkable portfolio comprising seven patents. His work primarily focuses on advanced polishing compositions and methods, leveraging his extensive expertise in the field.

Latest Patents

Among his latest innovations, Liqing has developed two significant patents related to polishing compositions. The first patent describes a polishing composition that incorporates various components, including abrasives, organic acids or salts, specific amine compounds, and an aqueous solvent. This composition aims to enhance the polishing process's efficiency and effectiveness.

The second patent revolves around a polishing composition designed to improve the removal rates of barrier films and hard mask materials, particularly surfaces featuring ruthenium. This innovative method involves applying the composition to a substrate's surface, followed by the meticulous movement of a polishing pad to achieve optimal results.

Career Highlights

Liqing Wen has made significant contributions to the field of electronic materials through his work at notable companies such as Fujifilm Electronic Materials U.S.A., Inc. and Fujifilm Planar Solutions, LLC. His dedication to innovation in polishing compositions has established him as a key player in advancing semiconductor manufacturing processes.

Collaborations

Throughout his career, Liqing has worked closely with esteemed colleagues, including Bin Hu and Yannan Liang. These collaborations reflect a shared commitment to pioneering advancements in the field, driving innovations that address complex challenges in the industry.

Conclusion

Liqing Wen's inventive spirit and dedication to innovation have left an indelible mark on the polishing composition landscape. As he continues to build on his successful career, his patents serve as a testament to his contributions, promising to shape the future of electronic materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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