The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
May. 21, 2018
Applicant:
Fujifilm Planar Solutions, Llc, Mesa, AZ (US);
Inventors:
Yannan Liang, Gilbert, AZ (US);
Liqing Wen, Mesa, AZ (US);
Bin Hu, Chandler, AZ (US);
Hyosang Lee, Chandler, AZ (US);
Shu-Wei Chang, Taoyuan, TW;
Sung Tsai Lin, Taoyuan, TW;
Assignee:
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC., North Kingston, RI (US);
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 21/3212 (2013.01);
Abstract
A slurry that polishes surfaces or substrates which includes cobalt. The slurry further comprises an anionic and/or cationic surfactant, each of which has a phosphate group, a long chain alkyl group, or both. The slurry also includes a corrosion inhibitor, abrasives, removal rate enhancers, solvents, pH adjustors, and chelating agents. The pH of the slurry is preferably 8 or higher.