Yannan Liang

Title: Yannan Liang: Innovator in Polishing Compositions

Introduction

Yannan Liang is a prominent inventor based in Gilbert, AZ, known for his significant contributions to the field of polishing compositions. With a total of 12 patents to his name, Liang has made remarkable advancements that enhance the efficiency and effectiveness of polishing processes in various applications.

Latest Patents

Liang's latest patents include innovative formulations for polishing compositions. One notable patent features a polishing composition that incorporates at least one abrasive, a first corrosion inhibitor with a phosphate or phosphonate group, a complexing agent, a second corrosion inhibitor that is an azole compound, and optionally a pH adjuster. Another patent describes a polishing composition that includes an abrasive, a pH adjuster, a barrier film removal rate enhancer, a low-k removal rate inhibitor, an azole-containing corrosion inhibitor, and a ruthenium removal rate enhancer. The methods outlined in these patents involve applying the polishing composition to a substrate surface, which may consist of ruthenium or a hard mask material, followed by the use of a pad to polish the surface effectively.

Career Highlights

Yannan Liang has established a successful career at Fujifilm Electronic Materials U.S.A., Inc., where he continues to innovate and develop new polishing solutions. His work has significantly impacted the semiconductor industry, where precision polishing is crucial for manufacturing high-quality electronic components.

Collaborations