The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Nov. 21, 2023
Applicant:

Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);

Inventors:

Ting-Kai Huang, Tainan City, TW;

Yannan Liang, Gilbert, AZ (US);

Bin Hu, Chandler, AZ (US);

Chun-Fu Chen, Zhubei City, TW;

Ying-Shen Chuang, Taoyuan City, TW;

Tzu-Wei Chiu, Caotun Township, TW;

Sung Tsai Lin, Taoyuan City, TW;

Hanyu Fan, Chandler, AZ (US);

Hsin-Hsien Lu, Hsinchu City, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); B24B 37/04 (2012.01); C09G 1/00 (2006.01); C09K 3/14 (2006.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); H10P 52/402 (2026.01); H10P 52/403 (2026.01);
Abstract

This disclosure relates to a polishing composition that includes an abrasive, at least two pH adjusters, a barrier film removal rate enhancer, a low-k removal rate inhibitor; and an azole-containing corrosion inhibitor. This disclosure also features a method of using the polishing composition to polish a substrate containing copper and silicon oxide.


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