Company Filing History:
Years Active: 2020-2025
Title: Innovations by Sung Tsai Lin
Introduction
Sung Tsai Lin is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of polishing compositions and methods, holding a total of 2 patents. His work is primarily associated with Fujifilm Electronic Materials U.S.A., Inc., where he has developed innovative solutions for chemical mechanical polishing.
Latest Patents
Sung Tsai Lin's latest patents include two key innovations. The first patent is for polishing compositions and methods of use thereof. This disclosure features a polishing composition that includes at least one abrasive, at least one first corrosion inhibitor that includes a phosphate or a phosphonate group, at least one complexing agent, at least one second corrosion inhibitor that is at least one azole compound, and optionally a pH adjuster. The second patent is for a chemical mechanical polishing slurry for cobalt applications. This slurry polishes surfaces or substrates that include cobalt and comprises an anionic and/or cationic surfactant, each of which has a phosphate group, a long chain alkyl group, or both. Additionally, the slurry includes a corrosion inhibitor, abrasives, removal rate enhancers, solvents, pH adjustors, and chelating agents, with a preferred pH of 8 or higher.
Career Highlights
Throughout his career, Sung Tsai Lin has demonstrated a commitment to innovation in the field of electronic materials. His work has contributed to advancements in polishing technologies, which are essential for various applications in the electronics industry.
Collaborations
Sung Tsai Lin has collaborated with several talented individuals, including Yannan Liang and Liqing Wen. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Sung Tsai Lin's contributions to polishing compositions and methods highlight his role as an influential inventor in the electronics materials sector. His innovative patents continue to impact the industry positively.