The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Aug. 04, 2022
Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);
Ting-Kai Huang, Tainan, TW;
Tawei Lin, Chandler, AZ (US);
Bin Hu, Chandler, AZ (US);
Liqing Wen, Mesa, AZ (US);
Yannan Liang, Gilbert, AZ (US);
Fujifilm Electronic Materials U.S.A., Inc., N. Kingstown, RI (US);
Abstract
A polishing composition includes an abrasive; a pH adjuster; a barrier film removal rate enhancer; a low-k removal rate inhibitor; an azole-containing corrosion inhibitor; and a hard mask removal rate enhancer. A method of polishing a substrate includes the steps of: applying the polishing composition described herein to a surface of a substrate, wherein the surface comprises ruthenium or a hard mask material; and bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate.