Ting-Kai Huang is a notable inventor based in Taiwan, CN. He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of compositions that enhance the polishing of ruthenium surfaces. With a total of 6 patents to his name, Huang's work is recognized for its innovative approach and practical applications.

Latest Patents

Huang's latest patents include a bulk ruthenium chemical mechanical polishing composition. This composition is designed to polish surfaces or substrates that include ruthenium, utilizing a synergistic combination of ammonia and oxygenated halogen compounds. Additionally, it may contain abrasives and acids to enhance its effectiveness. Another notable patent involves polishing compositions and methods that include various components such as abrasives, pH adjusters, and corrosion inhibitors, aimed at improving the polishing process for substrates with ruthenium or hard mask materials.

Career Highlights

Ting-Kai Huang is currently employed at Fujifilm Electronic Materials U.S.A., Inc. His work at this company has allowed him to focus on advancing polishing technologies that are crucial for semiconductor manufacturing. Huang's expertise in this area has positioned him as a key player in the development of innovative materials and processes.

Collaborations

Huang has collaborated with several professionals in his field, including Bin Hu and Yannan Liang. These collaborations have contributed to the successful development of his patented technologies and have fostered a productive research environment.

Conclusion

Ting-Kai Huang's contributions to the field of chemical mechanical polishing are significant and impactful. His innovative patents and career at Fujifilm Electronic Materials U.S.A., Inc. highlight his dedication to advancing technology in this area.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com