The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Dec. 15, 2022
Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);
Bin Hu, Chandler, AZ (US);
Binh Duong, Gilbert, AZ (US);
Carl Ballesteros, San Tan Valley, AZ (US);
Yannan Liang, Gilbert, AZ (US);
Hyosang Lee, Chandler, AZ (US);
Fujifilm Electronic Materials U.S.A., Inc., North Kingstown, RI (US);
Abstract
This disclosure relates to a method that includes applying a polishing composition to a surface of a substrate; bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate to create a polished substrate; treating the polished substrate with a rinse solvent; flowing a vapor over a meniscus formed at an interface between air and the rinse solvent on the polished substrate. The vapor includes a first component containing a water miscible organic solvent, a second component containing a cleaning agent, and a third component containing an inert gas.