The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2026
Filed:
Dec. 10, 2021
Applicant:
Fujifilm Electronic Materials U.s.a., Inc., North Kingstown, RI (US);
Inventors:
Yannan Liang, Gilbert, AZ (US);
Bin Hu, Chandler, AZ (US);
Ting-Kai Huang, Tainan, TW;
Shu-Wei Chang, Taoyuan District, TW;
Liqing (Richard) Wen, Mesa, AZ (US);
Assignee:
FUJIFILM Electronic Materials U.S.A., Inc., North Kingstown, RI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H10P 52/402 (2026.01);
Abstract
A polishing composition includes at least one abrasive, at least one organic acid, at least one anionic surfactant comprising at least a phosphate, at least one phosphonic acid compound having a molecular weight below 500 g/mol, at least one azole containing compound, at least one alkylamine compound having a 6-24 carbon alkyl chain, and an aqueous solvent, and optionally, a pH adjuster.