Company Filing History:
Years Active: 2021-2024
Title: Liqing (Richard) Wen: Innovator in Ruthenium Polishing Technologies
Introduction
Liqing (Richard) Wen is a prominent inventor based in Mesa, AZ, known for his significant contributions to the field of chemical mechanical polishing. With a total of 4 patents to his name, Wen has developed innovative solutions that enhance the polishing processes for materials that include ruthenium.
Latest Patents
Wen's latest patents include a "Bulk Ruthenium Chemical Mechanical Polishing Composition" and a "Barrier Ruthenium Chemical Mechanical Polishing Slurry." The bulk composition is designed to polish surfaces that partially consist of ruthenium, utilizing a synergistic combination of ammonia and oxygenated halogen compounds. This composition may also include abrasives and acids, with a pH range between 6 and 8. The barrier slurry, on the other hand, is formulated for polishing substrates that comprise both ruthenium and copper. It includes components such as alkali hydroxide and halogen alkyl benzotriazole, ensuring a high removal rate ratio of ruthenium to copper.
Career Highlights
Wen is currently employed at Fujifilm Electronic Materials U.S.A., Inc., where he continues to innovate in the field of electronic materials. His work focuses on developing advanced polishing compositions that improve the efficiency and effectiveness of surface preparation in semiconductor manufacturing.
Collaborations
Throughout his career, Wen has collaborated with notable colleagues, including David (Tawei) Lin and Bin Hu. These partnerships have contributed to the advancement of polishing technologies and the successful development of new materials.
Conclusion
Liqing (Richard) Wen's contributions to the field of chemical mechanical polishing are noteworthy, as he continues to push the boundaries of innovation in this critical area of technology. His work not only enhances the performance of polishing processes but also supports the broader semiconductor industry.