The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Feb. 22, 2012
Hyungjun Kim, Gilbert, AZ (US);
Richard Wen, Mesa, AZ (US);
Bin HU, Chandler, AZ (US);
Minae Tanaka, Gilbert, AZ (US);
Deepak Mahulikar, Madison, CT (US);
Hyungjun Kim, Gilbert, AZ (US);
Richard Wen, Mesa, AZ (US);
Bin Hu, Chandler, AZ (US);
Minae Tanaka, Gilbert, AZ (US);
Deepak Mahulikar, Madison, CT (US);
Fujifilm Planar Solutions, LLC, Adrian, MI (US);
Abstract
The present disclosure provides a concentrate for use in chemical mechanical polishing slurries, and a method of diluting that concentrate to a point of use slurry. The concentrate comprises abrasive, complexing agent, and corrosion inhibitor, and the concentrate is diluted with water and oxidizer. These components are present in amounts such that the concentrate can be diluted at very high dilution ratios, without affecting the polishing performance.