For the Inventor, By the Inventor

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San Diego, CA, United States of America

Electron Vision Corporation

USPTO Granted Patents = 18

Forward Citations = 566

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12 inventors (with patents filed for the assignee):

Matthew F Ross (11 out of 22 patents)

William R Livesay (8 out of 60 patents)

Selmer Wong (4 out of 4 patents)

4. Heike Thompson (2 out of 4 patents)

5. Anthony L Rubiales (2 out of 2 patents)

6. Jason P Minter (2 out of 3 patents)

7. Charles Hannes (1 out of 2 patents)

8. Trey Marlowe (1 out of 1 patent)

9. Mark Narcy (1 out of 1 patent)

10. John R Lee (1 out of 1 patent)

11. Richard Ross (1 out of 1 patent)

12. David M Rose (1 out of 9 patents)

18 patents: Sort by Forward Citations

1. 6607991 - Method for curing spin-on dielectric films utilizing electron beam radiation (2003-08-19),

2. 6551926 - Electron beam annealing of metals, alloys, nitrides and silicides (2003-04-22),

3. 6548899 - Method of processing films prior to chemical vapor deposition using electron beam processing (2003-04-15),

4. 6489225 - Method for controlling dopant profiles and dopant activation by electron beam processing (2002-12-03),

5. 6426127 - Electron beam modification of perhydrosilazane spin-on glass (2002-07-30),

6. 6407399 - Uniformity correction for large area electron source (2002-06-18),

7. 6358670 - Enhancement of photoresist plasma etch resistance via electron beam surface cure (2002-03-19),

8. 6340556 - Tailoring of linewidth through electron beam post exposure (2002-01-22),

9. 6319655 - Modification of 193 nm sensitive photoresist materials by electron beam exposure (2001-11-20),

10. 6271146 - Electron beam treatment of fluorinated silicate glass (2001-08-07),

11. 6255035 - Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devices (2001-07-03),

12. 6218090 - Method of creating controlled discontinuity between photoresist and substrate for improving metal lift off (2001-04-17),

13. 6207555 - Electron beam process during dual damascene processing (2001-03-27),

14. 6204201 - Method of processing films prior to chemical vapor deposition using electron beam processing (2001-03-20),

15. 6195246 - Electrostatic chuck having replaceable dielectric cover (2001-02-27),

Company Overview

Electron Vision Corporation, based in San Diego, CA, specializes in advanced imaging technologies and solutions. The company focuses on developing innovative systems that enhance visual data capture and analysis across various sectors, including medical imaging, industrial inspection, and security applications. With a commitment to research and development, Electron Vision aims to push the boundaries of imaging capabilities, providing cutting-edge tools that support precision and efficiency in critical operations.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

18 Patents

#329 in San Diego, CA

#4,293 in California

#17,974 in US

#34,244 in the World

San Diego, CA, United States of America

Electron Vision Corporation

Forward Citations = 566

12 inventors:

Matthew F Ross (11 out of 22 patents)

William R Livesay (8 out of 60 patents)

Selmer Wong (4 out of 4 patents)

4. Heike Thompson (2 out of 4 patents)

5. Anthony L Rubiales (2 out of 2 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Electron Vision Corporation. Retrieved from https://idiyas.com/company/electron-vision

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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