Company Filing History:
Years Active: 2000-2003
Title: The Innovative Contributions of Anthony L Rubiales
Introduction
Anthony L Rubiales is a notable inventor based in Poway, California. He has made significant contributions to the field of semiconductor manufacturing through his innovative methods for curing dielectric materials. With a total of 2 patents, Rubiales has demonstrated his expertise and commitment to advancing technology in this area.
Latest Patents
Rubiales' latest patents include a method for curing spin-on dielectric films utilizing electron beam radiation. This method provides a means of curing spin-on-glass or spin-on-polymer dielectric material formed on a semiconductor wafer. The dielectric material plays a crucial role in insulating the conductive metal layer and planarizing the topography during the manufacturing of multilayered integrated circuits. The process involves a large area, uniform electron beam exposure system in a soft vacuum environment. A wafer coated with uncured dielectric material is irradiated with electrons of sufficient energy to penetrate the entire thickness of the dielectric material while being heated by infrared heaters. By adjusting various process conditions, the properties of the cured dielectric material can be modified.
Another significant patent by Rubiales is the method for curing spin-on-glass film utilizing electron beam radiation. This method also focuses on curing spin-on-glass formed on a semiconductor wafer, which insulates the conductive metal layer and planarizes the topography in multilayered integrated circuits. Similar to his previous patent, this method utilizes a large area, uniform electron beam exposure system in a soft vacuum environment. The wafer is coated with uncured siloxane spin-on-glass and is irradiated with electrons while being heated to a peak temperature in a soft vacuum environment. The process ensures that the substrate is cooled before removal from the vacuum.
Career Highlights
Rubiales is currently associated with Electron Vision Corporation, where he continues to innovate and contribute to the field of semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Some of his notable coworkers include William R Livesay and Matthew F Ross, who have collaborated with Rubiales on various projects within the company.
Conclusion
Anthony L Rubiales stands out as a significant figure in the field of semiconductor manufacturing, with his innovative patents paving the way for advancements in technology. His contributions continue to impact the industry positively.