Company Filing History:
Years Active: 2001
Title: Innovations of John R Lee in Semiconductor Manufacturing
Introduction
John R Lee is a notable inventor based in Plano, TX (US), recognized for his contributions to the field of semiconductor manufacturing. With a focus on enhancing the efficiency and effectiveness of metal T-gate structures, Lee has made significant strides in the industry. His innovative approach has led to the development of a unique patent that addresses critical challenges in the manufacturing process.
Latest Patents
Lee holds a patent for a method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devices. This process involves the deposition of first and second photoresist layers onto a substrate, followed by individual overall electron beam exposure of both layers. Subsequent imagewise UV exposure and development of both layers result in the formation of hollow cavities. By concentrating the electron beam radiation on the mid-point in the thickness of each photoresist layer, the radiation is effectively distributed, leading to solubility properties that facilitate the creation of hollow cavities with desired shapes. In one embodiment, three-dimensional structures are formed in the photoresist layers by filling these cavities with metal, ultimately producing a dielectric substrate with T-shaped metal contacts on its surface.
Career Highlights
John R Lee is currently associated with Electron Vision Corporation, where he applies his expertise in semiconductor technology. His innovative methods have positioned him as a key player in the advancement of high-speed semiconductor devices. With a patent count of 1 patent, Lee continues to contribute to the evolution of semiconductor manufacturing techniques.
Collaborations
Lee collaborates with Jason P Minter, working together to push the boundaries of semiconductor technology and improve manufacturing processes.
Conclusion
John R Lee's innovative contributions to semiconductor manufacturing highlight his role as a significant inventor in the field. His patented methods for creating optimal photoresist structures demonstrate his commitment to advancing technology in high-speed semiconductor devices.