Company Filing History:
Years Active: 2003
Title: Mark Narcy: Innovator in Semiconductor Technology
Introduction
Mark Narcy is a notable inventor based in Escondido, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of dielectric materials used in integrated circuits. His innovative approach has led to advancements that enhance the manufacturing processes of multilayered integrated circuits.
Latest Patents
Mark Narcy holds a patent for a "Method for curing spin-on dielectric films utilizing electron beam radiation." This patent describes an electron beam exposure method that provides a means of curing spin-on-glass or spin-on-polymer dielectric material formed on a semiconductor wafer. The dielectric material plays a crucial role in insulating the conductive metal layer and planarizing the topography during the manufacturing process. The method utilizes a large area, uniform electron beam exposure system in a soft vacuum environment. A wafer coated with uncured dielectric material is irradiated with electrons of sufficient energy to penetrate the entire thickness of the dielectric material while being simultaneously heated by infrared heaters. By adjusting various process conditions, such as electron beam total dose and energy, wafer temperature, and ambient atmosphere, the properties of the cured dielectric material can be modified.
Career Highlights
Throughout his career, Mark Narcy has been associated with Electron Vision Corporation, where he has applied his expertise in semiconductor technology. His work has been instrumental in developing methods that improve the efficiency and effectiveness of dielectric materials in integrated circuits.
Collaborations
Mark has collaborated with notable colleagues, including William R Livesay and Matthew F Ross. These collaborations have contributed to the advancement of technology in the semiconductor industry.
Conclusion
Mark Narcy's innovative contributions to semiconductor technology, particularly through his patented methods, have significantly impacted the manufacturing processes of integrated circuits. His work continues to influence the field and drive advancements in technology.