Selmer Wong

Title: Selmer Wong: Innovator in Electron Beam Technology

Introduction

Selmer Wong is a prominent inventor based in San Diego, CA, known for his contributions to the field of semiconductor manufacturing. With a total of 4 patents to his name, Wong has made significant advancements in the methods used for curing dielectric materials in integrated circuits.

Latest Patents

Wong's latest patents include a method for curing spin-on dielectric films utilizing electron beam radiation. This innovative technique provides a means of curing spin-on-glass or spin-on-polymer dielectric material formed on semiconductor wafers. The method employs a large area, uniform electron beam exposure system in a soft vacuum environment. By adjusting various process conditions, such as electron beam total dose and energy, the properties of the cured dielectric material can be modified. Another notable patent focuses on enhancing photoresist plasma etch resistance via electron beam surface cure. This process increases the etch resistance of the upper surface of photoresists without causing significant shrinkage in the bulk of the film.

Career Highlights

Wong is currently associated with Electron Vision Corporation, where he continues to innovate in the field of electron beam technology. His work has been instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Wong has collaborated with notable colleagues, including Matthew F. Ross and William R. Livesay, contributing to various projects that push the boundaries of technology in their field.

Conclusion

Selmer Wong's contributions to electron beam technology and semiconductor manufacturing have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence advancements in the field.