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Scotts Valley, CA, United States of America

Aviza Technology Limited

USPTO Granted Patents = 29

% Expired Patents = 51.7

EPO Patents = 2

Trademarks = 2

Forward Citations = 1,437

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57 inventors (with patents filed for the assignee):

Yoshihide Senzaki (5 out of 7 patents)

Gary Proudfoot (3 out of 3 patents)

Robert Kenneth Trowell (3 out of 6 patents)

4. Gordon R Green (3 out of 12 patents)

5. John Macneil (2 out of 11 patents)

6. Andrew Price (2 out of 6 patents)

7. Jay DeDontney (2 out of 7 patents)

8. Christopher David George (2 out of 2 patents)

9. Alan Lee Starner (2 out of 7 patents)

10. Hilario L Oh (2 out of 16 patents)

11. Seung Gyun Park (2 out of 2 patents)

12. Cole Porter (2 out of 2 patents)

13. Jason Melvin (2 out of 2 patents)

14. Christopher T Ratliff (2 out of 7 patents)

15. Jeffrey M Kowalski (2 out of 3 patents)

Core Competencies:

Sputtering

Substrate Processing

Ion Deposition

Plasma Sources

Dielectric Films

Chemical Mechanical Polishing

Thermal CVD

High-k Dielectric

In-situ Formation

Gas Distribution

Temperature Control

Modular Injector

29 patents: Sort by Forward Citations

1. 8585873 - Methods and apparatus for sputtering (2013-11-19),

2. 8486198 - Method of processing substrates (2013-07-16),

3. 8425741 - Ion deposition apparatus having rotatable carousel for supporting a plurality of targets (2013-04-23),

4. 8400063 - Plasma sources (2013-03-19),

5. 8354652 - Ion source including separate support systems for accelerator grids (2013-01-15),

6. 7732307 - Method of forming amorphous TiN by thermal chemical vapor deposition (CVD) (2010-06-08),

7. 7470470 - System and method for forming multi-component dielectric films (2008-12-30),

8. 7403089 - Magnet assemblies (2008-07-22),

9. 7351669 - Method of forming a substantially closed void (2008-04-01),

10. 7335569 - In-situ formation of metal insulator metal capacitors (2008-02-26),

11. 7282158 - Method of processing a workpiece (2007-10-16),

12. 7205247 - Atomic layer deposition of hafnium-based high-k dielectric (2007-04-17),

13. 7205246 - Forming low k dielectric layers (2007-04-17),

14. 7202167 - Method of forming a diffusion barrier (2007-04-10),

15. 7153580 - Low κ dielectric inorganic/organic hybrid films and method of making (2006-12-26),

Company Overview

Aviza Technology Limited is a technology company based in Scotts Valley, California, specializing in advanced manufacturing solutions for the semiconductor and microelectronics industries. The organization focuses on developing innovative equipment and processes that enhance the production of high-performance electronic components. With a commitment to research and development, Aviza plays a crucial role in advancing technologies that support the growing demands of the electronics market, particularly in areas such as deposition and etching processes.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

29 Patents

#10 in Scotts Valley, CA

#2,768 in California

#11,631 in US

#22,570 in the World

Scotts Valley, CA, United States of America

Aviza Technology Limited

Forward Citations = 1,437

57 inventors:

Yoshihide Senzaki (5 out of 7 patents)

Gary Proudfoot (3 out of 3 patents)

Robert Kenneth Trowell (3 out of 6 patents)

4. Gordon R Green (3 out of 12 patents)

5. John Macneil (2 out of 11 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Aviza Technology Limited. Retrieved from https://idiyas.com/company/aviza-technology

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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