Andrew Price

Title: The Innovative Contributions of Andrew Price

Introduction

Andrew Price is a notable inventor based in Gwent, GB, recognized for his significant contributions to the field of plasma processing technology. With a total of six patents to his name, Price has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, one is titled "Method of cleaning a plasma processing device." This invention outlines a technique for cleaning a chamber of a plasma processing device using radicals. The method involves creating plasma within a remote plasma source, allowing radicals to enter the chamber while minimizing the entry of ions. Additionally, it includes detecting a DC bias on a chamber component during cleaning to determine the cleaning endpoint. Another significant patent is the "Method of improving adhesion," which focuses on enhancing the adhesion between a semiconductor substrate and a dielectric layer. This method employs a two-step plasma enhanced chemical vapor deposition (PECVD) process to deposit a silicon dioxide adhesion layer followed by a dielectric layer.

Career Highlights

Throughout his career, Andrew Price has worked with prominent companies in the technology sector, including SPTS Technologies Limited and Aviza Technology Limited. His work in these organizations has contributed to advancements in semiconductor processing technologies.

Collaborations

Price has collaborated with several professionals in his field, including Stephen Robert Burgess and Kathrine Crook. These collaborations have likely fostered innovation and the sharing of ideas within the industry.

Conclusion

Andrew Price's contributions to plasma processing technology through his patents and career achievements highlight his role as a significant inventor in the semiconductor industry. His innovative methods continue to influence advancements in manufacturing processes.