The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
May. 09, 2017
Applicant:
Spts Technologies Limited, Newport, GB;
Inventors:
Assignee:
SPTS Technologies Limited, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/452 (2006.01); C23C 16/52 (2006.01); B08B 7/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); B08B 7/0035 (2013.01); C23C 16/452 (2013.01); C23C 16/52 (2013.01); H01J 37/32357 (2013.01); H01J 37/32862 (2013.01); H01J 37/32963 (2013.01); H01J 2237/335 (2013.01);
Abstract
A method of cleaning a chamber of a plasma processing device with radicals includes creating a plasma within a remote plasma source which is separated from the chamber, the plasma including radicals and ions, cleaning the chamber by allowing radicals to enter the chamber from the remote plasma source while preventing the majority of the ions created in the remote plasma source from entering the chamber, detecting a DC bias developed on a component of the chamber during cleaning; and using the detected DC bias to determine an end-point of the cleaning and, on determination of the end-point, to stop the cleaning.