For the Inventor, By the Inventor

Enter assignee name

Grenoble, France

Aselta Nanographics

USPTO Granted Patents = 16

EPO Patents = 13

Forward Citations = 22

Loading Chart...

Loading Chart...

16 inventors (with patents filed for the assignee):

Patrick Schiavone (8 out of 12 patents)

Thiago Figueiro (8 out of 8 patents)

Charles Tiphine (4 out of 4 patents)

4. Mohamed Saib (3 out of 3 patents)

5. Thomas Quaglio (3 out of 4 patents)

6. Luc Martin (3 out of 4 patents)

7. Sébastien Bayle (2 out of 2 patents)

8. Nader Jedidi (2 out of 2 patents)

9. Mohamed Saïb (2 out of 2 patents)

10. Jerome Belledent (2 out of 6 patents)

11. Jean-Hervé Tortai (1 out of 1 patent)

12. Mathieu Millequant (1 out of 1 patent)

13. Aurélien Fay (1 out of 2 patents)

14. Serdar Manakli (1 out of 6 patents)

15. Jean-Herve Tortai (1 out of 1 patent)

16 patents: Sort by Forward Citations

1. 10578978 - Method for determining the dose corrections to be applied to an IC manufacturing process by a matching procedure (2020-03-03),

2. 10553394 - Method for the correction of electron proximity effects (2020-02-04),

3. 10534255 - Method of applying vertex based corrections to a semiconductor design (2020-01-14),

4. 10522328 - Method of performing dose modulation, in particular for electron beam lithography (2019-12-31),

5. 10423074 - Method for calculating the metrics of an IC manufacturing process (2019-09-24),

6. 10295912 - Method for determining the parameters of an IC manufacturing process model (2019-05-21),

7. 10157728 - Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes (2018-12-18),

8. 10156796 - Method for determining the parameters of an IC manufacturing process by a differential procedure (2018-12-18),

9. 9934336 - Method of correcting electron proximity effects using Voigt type scattering functions (2018-04-03),

10. 9922159 - Free form fracturing method for electronic or optical lithography (2018-03-20),

11. 9891519 - Free form fracturing method for electronic or optical lithography using resist threshold control (2018-02-13),

12. 9542505 - Method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography (2017-01-10),

13. 9430597 - Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device (2016-08-30),

14. 9224577 - Method for correcting electronic proximity effects using off-center scattering functions (2015-12-29),

15. 9223926 - Method for correcting electronic proximity effects using the deconvolution of the pattern to be exposed by means of a probabilistic method (2015-12-29),

Aselta Nanographics is a leading provider of advanced lithography solutions for the semiconductor industry. Our innovative graphical techniques enable high-resolution printing on a nanoscale, delivering superior quality and precision. With a focus on research and development, we strive to push the boundaries of nanolithography and drive advancements in semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

16 Patents

#17 in Grenoble

#1,185 in France

#36,676 in the World

Grenoble, France

Aselta Nanographics

Forward Citations = 22

16 inventors:

Patrick Schiavone (8 out of 12 patents)

Thiago Figueiro (8 out of 8 patents)

Charles Tiphine (4 out of 4 patents)

4. Mohamed Saib (3 out of 3 patents)

5. Thomas Quaglio (3 out of 4 patents)

Please report any incorrect information to support@idiyas.com

Loading…