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Grenoble, France

Aselta Nanographics

USPTO Granted Patents = 16

% Expired Patents = 6.3

EPO Patents = 13

Forward Citations = 27

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16 inventors (with patents filed for the assignee):

Patrick Schiavone (8 out of 12 patents)

Thiago Figueiro (8 out of 8 patents)

Charles Tiphine (4 out of 4 patents)

4. Mohamed Saib (3 out of 3 patents)

5. Thomas Quaglio (3 out of 4 patents)

6. Luc Martin (3 out of 4 patents)

7. Sébastien Bayle (2 out of 2 patents)

8. Nader Jedidi (2 out of 2 patents)

9. Mohamed Saïb (2 out of 2 patents)

10. Jerome Belledent (2 out of 6 patents)

11. Jean-Hervé Tortai (1 out of 1 patent)

12. Mathieu Millequant (1 out of 1 patent)

13. Aurélien Fay (1 out of 2 patents)

14. Serdar Manakli (1 out of 6 patents)

15. Jean-Herve Tortai (1 out of 1 patent)

16 patents: Sort by Forward Citations

1. 10578978 - Method for determining the dose corrections to be applied to an IC manufacturing process by a matching procedure (2020-03-03),

2. 10553394 - Method for the correction of electron proximity effects (2020-02-04),

3. 10534255 - Method of applying vertex based corrections to a semiconductor design (2020-01-14),

4. 10522328 - Method of performing dose modulation, in particular for electron beam lithography (2019-12-31),

5. 10423074 - Method for calculating the metrics of an IC manufacturing process (2019-09-24),

6. 10295912 - Method for determining the parameters of an IC manufacturing process model (2019-05-21),

7. 10157728 - Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes (2018-12-18),

8. 10156796 - Method for determining the parameters of an IC manufacturing process by a differential procedure (2018-12-18),

9. 9934336 - Method of correcting electron proximity effects using Voigt type scattering functions (2018-04-03),

10. 9922159 - Free form fracturing method for electronic or optical lithography (2018-03-20),

11. 9891519 - Free form fracturing method for electronic or optical lithography using resist threshold control (2018-02-13),

12. 9542505 - Method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography (2017-01-10),

13. 9430597 - Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device (2016-08-30),

14. 9224577 - Method for correcting electronic proximity effects using off-center scattering functions (2015-12-29),

15. 9223926 - Method for correcting electronic proximity effects using the deconvolution of the pattern to be exposed by means of a probabilistic method (2015-12-29),

Company Overview

Aselta Nanographics is a pioneering company based in Grenoble, France, specializing in advanced nanotechnology solutions. The organization focuses on the development and manufacturing of innovative materials and processes that enhance the performance of various applications, particularly in the fields of optics and electronics. With a commitment to research and development, Aselta Nanographics aims to push the boundaries of technology, providing cutting-edge solutions that cater to diverse industrial needs.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

16 Patents

#17 in Grenoble

#1,210 in France

#37,831 in the World

Grenoble, France

Aselta Nanographics

Forward Citations = 27

16 inventors:

Patrick Schiavone (8 out of 12 patents)

Thiago Figueiro (8 out of 8 patents)

Charles Tiphine (4 out of 4 patents)

4. Mohamed Saib (3 out of 3 patents)

5. Thomas Quaglio (3 out of 4 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Aselta Nanographics. Retrieved from https://idiyas.com/company/aselta-nanographics

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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