Location History:
- Saint Martin le Vinoux, FR (2015 - 2018)
- Saint Egreve, FR (2019)
Company Filing History:
3 out of 16 
1 out of 832,880 Years Active: 2015-2019
Title: Luc Martin: Innovator in Particle and Photon Beam Technology
Introduction
Luc Martin, an accomplished inventor based in Saint Egreve, France, has made significant contributions to the fields of direct writing and lithography. With a notable portfolio of four patents, his work focuses on enhancing the efficiency and precision of particle and photon beam technologies.
Latest Patents
Among Luc's innovative developments is his method of reducing shot count in direct writing by a particle or photon beam. This sophisticated approach involves transferring a fractured pattern decomposed into elementary shapes onto a substrate. The method includes identifying removable elementary shapes that, when eliminated, yield modifications within a preset tolerance envelope. The subsequent steps enable a precise exposure of the substrate to a series of shots, each corresponding to an elementary shape of the modified fractured pattern. Additionally, he introduced a free-form fracturing method for electronic or optical lithography. This computer-implemented technique fractures a surface into elementary features, catering to patterns with either rectilinear or curvilinear forms. The method allows for crucial resolution adjustments through a second fracturing step utilizing enhanced Resolution Improvement Features (eRIFs), strategically positioned to optimize the desired pattern.
Career Highlights
Throughout his career, Luc has contributed to the advancement of technology while working with prominent organizations, including Aselta Nanographics. His expertise in the field has allowed him to innovate and develop methods that push the boundaries of what is possible in particle and photon beam applications.
Collaborations
Collaboration has been a key aspect of Luc's career. He has worked closely with talented individuals such as Thomas Quaglio and Charles Tiphine, fostering a creative environment where innovative ideas can flourish.
Conclusion
In conclusion, Luc Martin stands out as a pioneering inventor whose work in reducing shot counts and improving surface fracturing methods has the potential to revolutionize electronic and optical lithography. His patents reflect his deep understanding of the technology and commitment to advancing the field, making him a valuable asset to the innovation landscape in France and beyond.