Sébastien Bayle

Title: Sébastien Bayle: Innovator in IC Manufacturing Processes

Introduction

Sébastien Bayle is a notable inventor based in Lan-en-Vercors, France. He has made significant contributions to the field of integrated circuit (IC) manufacturing, holding 2 patents that showcase his innovative approaches. His work focuses on improving manufacturing processes through advanced methodologies.

Latest Patents

One of Sébastien Bayle's latest patents is a method for determining the dose corrections to be applied to an IC manufacturing process by a matching procedure. This method simplifies the determination of parameters for a second manufacturing process based on the parameters of a first process. It involves computing metrics that represent the differences between the two processes, which can be measured or derived from existing data. The metrics are calculated using a convolution of the target design and a combination of kernel and deformation functions. A reference physical model is established, and sizing corrections are calculated to convert into dose corrections.

Another significant patent is a lithography method with combined optimization of the radiated energy and geometry applicable to complex shapes. This method generates data for writing a pattern by electronic radiation, starting with a work pattern that is broken down into elementary outlines. Insolation conditions are defined for each outline, and a simulation pattern is calculated. If discrepancies arise between the simulation and the intended pattern, shift vectors are determined to modify the external envelope of the pattern, leading to further iterations for accuracy.

Career Highlights

Sébastien Bayle is currently employed at Aselta Nanographics, where he continues to develop innovative solutions in the field of IC manufacturing. His expertise and contributions have positioned him as a key player in advancing manufacturing technologies.

Collaborations

He collaborates with talented coworkers, including Mohamed Saib and Patrick Schiavone, who contribute to the innovative environment at Aselta Nanographics.

Conclusion

Sébastien Bayle's work exemplifies the spirit of innovation in the field of integrated circuit manufacturing. His patents reflect a commitment to enhancing manufacturing processes through advanced methodologies. His contributions are vital to the ongoing evolution of technology in this sector.