Aurélien Fay

Title: Aurélien Fay: Innovator in Electron-Beam Lithography

Introduction

Aurélien Fay is a notable inventor based in Grenoble, France. He has made significant contributions to the field of electron-beam lithography, holding two patents that showcase his innovative methods and techniques. His work is essential for advancements in integrated circuit manufacturing and pattern calibration.

Latest Patents

Aurélien Fay's latest patents include a method for calibrating elementary small patterns in variable-shaped-beam electron-beam lithography. This method involves producing a calibration pattern with geometric figures, measuring their actual critical dimensions, and applying a regression method to construct a mathematical model. This model helps in understanding variations in dimensions or exposure doses, which is crucial for transferring patterns to substrates effectively. His second patent focuses on calculating the metrics of an integrated circuit manufacturing process. This method utilizes a function representative of the target design, convoluted with a kernel function and a deformation function, to ensure accuracy in the manufacturing process.

Career Highlights

Throughout his career, Aurélien Fay has worked with prominent organizations such as the Commissariat à l'Énergie Atomique et aux Énergies Alternatives and Aselta Nanographics. His experience in these companies has allowed him to refine his skills and contribute to groundbreaking research in his field.

Collaborations

Aurélien has collaborated with notable professionals, including Jacky Chartoire and Mohamed Saïb. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Aurélien Fay is a distinguished inventor whose work in electron-beam lithography has paved the way for advancements in integrated circuit manufacturing. His innovative patents and collaborations highlight his significant contributions to the field.