Meylan, France

Jerome Belledent

USPTO Granted Patents = 6 

Average Co-Inventor Count = 1.7

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Crolles, FR (2014 - 2015)
  • Meylan, FR (2016 - 2017)

Company Filing History:


Years Active: 2014-2017

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6 patents (USPTO):Explore Patents

Title: Jerome Belledent: Innovator in Semiconductor Technology

Introduction

Jerome Belledent is a notable inventor based in Meylan, France. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods for manufacturing substrates and preparing patterns for electron beam lithography.

Latest Patents

One of his latest patents is a method for manufacturing a substrate provided with different active areas and with planar and three-dimensional transistors. This method involves successively providing a support, an electrically insulating layer, and a semiconductor material layer. A first protective mask completely covers a second area of the semiconductor material layer while leaving a first area uncovered. A second etching mask partially covers the first area and at least partially covers the second area, defining and separating the two areas. Lateral spacers are formed on the lateral surfaces of the second etching mask to create a third etching mask. The semiconductor material layer is then etched using this third etching mask to form a pattern made from semiconductor material in the first area, with the first etching mask protecting the second area.

Another significant patent is a method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography. This method includes modeling the pattern by breaking it down into a set of elementary geometric shapes intended for individual printing. For each shape, an electrical charge dose is determined for the electron beam during the printing process. This dose is selected from a discrete set of predetermined doses recorded in memory. The set of elementary geometric shapes forms a bidimensional paving covering the pattern to be printed, and a discretization error correction is made by dithering when determining the doses.

Career Highlights

Jerome has worked with prestigious organizations, including the Commissariat à l'Énergie Atomique et aux Énergies Alternatives. His experience in these institutions has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Throughout his career, Jerome has collaborated with notable professionals such as Sebastien Barnola and Laurent Pain. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Jerome Belledent is a distinguished inventor whose work in semiconductor technology has led to multiple patents and innovative methods. His contributions continue to influence the field and pave the way for future advancements.

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