The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2014
Filed:
Nov. 21, 2011
Sebastien Barnola, Villard-Bonnot, FR;
Jerome Belledent, Crolles, FR;
Sebastien Barnola, Villard-Bonnot, FR;
Jerome Belledent, Crolles, FR;
Abstract
The substrate is provided with a layer of first material, a first etching mask, a covering layer and a second etching mask. The covering layer has a covered main area and an uncovered secondary area. The secondary area of the covering layer is partially etched via the second etching mask to form a salient pattern. Lateral spacers are formed around the salient pattern defining a third etching mask. The second etching mask is eliminated. The covering layer is etched by means of the third etching mask to form a salient pattern in the covering layer and to uncover the first etching mask and the first material. The layer of first material is etched to form the pattern made from the first material.