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Yokohama, Japan

Advanced Mask Inspection Technology Inc.

USPTO Granted Patents = 24

Forward Citations = 68

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16 inventors (with patents filed for the assignee):

Junji Oaki (9 out of 31 patents)

Shinji Sugihara (5 out of 31 patents)

Yuichi Nakatani (4 out of 4 patents)

4. Ikunao Isomura (3 out of 30 patents)

5. Shinichi Imai (3 out of 13 patents)

6. Kyoji Yamashita (3 out of 19 patents)

7. Riki Ogawa (2 out of 64 patents)

8. Koji Nakajima (1 out of 20 patents)

9. Kazuto Matsuki (1 out of 11 patents)

10. Noboru Kobayashi (1 out of 19 patents)

11. Hiroyuki Nagahama (1 out of 11 patents)

12. Nobuyuki Harabe (1 out of 2 patents)

13. Masayuki Hideshima (1 out of 13 patents)

14. Yoshitake Tsuji (1 out of 1 patent)

15. Yasuko Saito (1 out of 1 patent)

24 patents: Sort by Forward Citations

1. 7809181 - Pattern inspection apparatus, image alignment method, displacement amount estimation method, and computer-readable recording medium with program recorded thereon (2010-10-05),

2. 7796803 - Image correction method and apparatus for use in pattern inspection system (2010-09-14),

3. 7787686 - Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection (2010-08-31),

4. 7781749 - Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system (2010-08-24),

5. 7764825 - Pattern inspection apparatus and method with enhanced test image correctability using frequency division scheme (2010-07-27),

6. 7756318 - Pattern inspection apparatus and method with local critical dimension error detectability (2010-07-13),

7. 7706623 - Image correcting method (2010-04-27),

8. 7664308 - Photomask inspection apparatus comparing optical proximity correction patterns to minimum and maximum limits (2010-02-16),

9. 7656516 - Pattern inspection apparatus (2010-02-02),

10. 7655904 - Target workpiece inspection apparatus, image alignment method, and computer-readable recording medium with program recorded thereon (2010-02-02),

11. 7643668 - Workpiece inspection apparatus, workpiece inspection method and computer-readable recording medium storing program (2010-01-05),

12. 7639863 - Die-to-database photomask defect detection using region data to modify inspection thresholds (2009-12-29),

13. 7630535 - Die-to-die photomask defect detection using region data to modify inspection thresholds (2009-12-08),

14. 7627165 - Pattern inspection method and apparatus using linear predictive model-based image correction technique (2009-12-01),

15. 7627164 - Pattern inspection method and apparatus with high-accuracy pattern image correction capability (2009-12-01),

Company Overview

Advanced Mask Inspection Technology Inc., based in Yokohama, Japan, specializes in the development of cutting-edge inspection technologies for semiconductor manufacturing. The company focuses on enhancing the quality and reliability of photomasks, which are critical components in the production of integrated circuits. By leveraging advanced imaging and analysis techniques, the organization aims to address the challenges of mask defects and improve overall manufacturing efficiency in the semiconductor industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

24 Patents

#49 in Yokohama

#2,633 in Japan

#26,660 in the World

Yokohama, Japan

Advanced Mask Inspection Technology Inc.

Forward Citations = 68

16 inventors:

Junji Oaki (9 out of 31 patents)

Shinji Sugihara (5 out of 31 patents)

Yuichi Nakatani (4 out of 4 patents)

4. Ikunao Isomura (3 out of 30 patents)

5. Shinichi Imai (3 out of 13 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Advanced Mask Inspection Technology Inc.. Retrieved from https://idiyas.com/company/advanced-mask-inspection-technology

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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