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Yokohamashi, Japan

Advanced Mask Inspection Technology Inc.

USPTO Granted Patents = 24

Forward Citations = 68

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16 inventors (with patents filed for the assignee):

Junji Oaki (9 out of 31 patents)

Shinji Sugihara (5 out of 28 patents)

Yuichi Nakatani (4 out of 4 patents)

4. Ikunao Isomura (3 out of 30 patents)

5. Shinichi Imai (3 out of 13 patents)

6. Kyoji Yamashita (3 out of 19 patents)

7. Riki Ogawa (2 out of 64 patents)

8. Koji Nakajima (1 out of 20 patents)

9. Kazuto Matsuki (1 out of 11 patents)

10. Noboru Kobayashi (1 out of 19 patents)

11. Hiroyuki Nagahama (1 out of 11 patents)

12. Nobuyuki Harabe (1 out of 2 patents)

13. Masayuki Hideshima (1 out of 13 patents)

14. Yoshitake Tsuji (1 out of 1 patent)

15. Yasuko Saito (1 out of 1 patent)

24 patents: Sort by Forward Citations

1. 7809181 - Pattern inspection apparatus, image alignment method, displacement amount estimation method, and computer-readable recording medium with program recorded thereon (2010-10-05),

2. 7796803 - Image correction method and apparatus for use in pattern inspection system (2010-09-14),

3. 7787686 - Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection (2010-08-31),

4. 7781749 - Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system (2010-08-24),

5. 7764825 - Pattern inspection apparatus and method with enhanced test image correctability using frequency division scheme (2010-07-27),

6. 7756318 - Pattern inspection apparatus and method with local critical dimension error detectability (2010-07-13),

7. 7706623 - Image correcting method (2010-04-27),

8. 7664308 - Photomask inspection apparatus comparing optical proximity correction patterns to minimum and maximum limits (2010-02-16),

9. 7656516 - Pattern inspection apparatus (2010-02-02),

10. 7655904 - Target workpiece inspection apparatus, image alignment method, and computer-readable recording medium with program recorded thereon (2010-02-02),

11. 7643668 - Workpiece inspection apparatus, workpiece inspection method and computer-readable recording medium storing program (2010-01-05),

12. 7639863 - Die-to-database photomask defect detection using region data to modify inspection thresholds (2009-12-29),

13. 7630535 - Die-to-die photomask defect detection using region data to modify inspection thresholds (2009-12-08),

14. 7627165 - Pattern inspection method and apparatus using linear predictive model-based image correction technique (2009-12-01),

15. 7627164 - Pattern inspection method and apparatus with high-accuracy pattern image correction capability (2009-12-01),

Advanced Mask Inspection Technology Inc. is a leading provider of advanced solutions for mask inspection in the semiconductor industry. With decades of experience and expertise, we offer state-of-the-art technologies and tools that ensure the highest standards of quality and accuracy in mask production. Our innovative products help semiconductor manufacturers detect and resolve any issues in the production process, resulting in improved yields and reduced costs. Visit our website to learn more about our solutions and how they can benefit your business.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

24 Patents

#6 in Yokohamashi

#2,583 in Japan

#25,864 in the World

Yokohamashi, Japan

Advanced Mask Inspection Technology Inc.

Forward Citations = 68

16 inventors:

Junji Oaki (9 out of 31 patents)

Shinji Sugihara (5 out of 28 patents)

Yuichi Nakatani (4 out of 4 patents)

4. Ikunao Isomura (3 out of 30 patents)

5. Shinichi Imai (3 out of 13 patents)

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