The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2009
Filed:
Nov. 22, 2005
Ikunao Isomura, Kanagawa, JP;
Ikunao Isomura, Kanagawa, JP;
Advanced Mask Inspection Technology Inc., Yokohama-shi, JP;
Abstract
A pattern inspection apparatus, including an optical image acquiring unit that acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern. The pattern inspection apparatus also includes a design image data generating unit that generates design image data based on a design pattern serving as a base of pattern formation of the target plate. The pattern inspection apparatus further includes a comparing unit that inputs region image data generated based on information of a region pattern which is input to the pattern inspection apparatus. The information of the region pattern represents a predetermined region and is formed in the same format as that of information of the design pattern. The comparing unit compares the optical image data with the design image data based on the region image data.