This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Advanced Mask Inspection Technology Inc., Kabushiki Kaisha Toshiba, Nec Corporation. Active years: 2009-2012.
Company Filing History:
1 out of 24 
1 out of 53,226 
1 out of 36,636 
Years Active: 2009-2012
Title: Nobuyuki Harabe: Innovator in Lithography Inspection Technology
Introduction
Nobuyuki Harabe is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of lithography inspection technology, holding a total of 2 patents. His work focuses on enhancing the accuracy and efficiency of pattern inspection methods.
Latest Patents
Harabe's latest patents include a technique for ultrafine pattern discrimination using transmitted and reflected workpiece images for use in lithography inspection systems. This innovative method allows for the discrimination of specific patterns, such as assist patterns, from integrated circuit patterns by utilizing both transmission and reflection images of the workpiece. The pattern discrimination device he developed includes an optical image acquisition unit that captures both transmissive and reflective images simultaneously, along with a specific pattern detection unit that extracts specific patterns based on distinguishing conditions.
Another significant patent is a high-accuracy pattern image correction capability for pattern inspection apparatus. This device features a correction region designation unit that identifies a correction region containing a pattern and its surrounding area within both an inspection reference pattern image and a pattern image under test. It also includes an equation generator that creates a set of simultaneous equations for the reference and under-test pattern images, a parameter generator that solves these equations to obtain multiple model parameters, and a corrected pattern image generator that applies linear predictive modeling to produce a corrected pattern image.
Career Highlights
Throughout his career, Nobuyuki Harabe has worked with prominent companies, including Advanced Mask Inspection Technology Inc. and Kabushiki Kaisha Toshiba. His experience in these organizations has allowed him to refine his skills and contribute to advancements in lithography inspection technology.
Collaborations
Harabe has collaborated with various professionals in his field, including Junji Oaki, enhancing the innovation process through teamwork and shared expertise.
Conclusion
Nobuyuki Harabe's contributions to lithography inspection technology through his patents and career achievements highlight his role as an influential inventor. His innovative techniques continue to shape the future of pattern inspection methods.