Company Badge
USPTO Data Jan 1 1976 - Nov 10 2026
6 Patents
#16 in Bloomfield Hills, MI
#1,528 in Michigan
#45,102 in US
Accretech USA, Inc.
Forward Citations = 104
15 inventors:
Bloomfield Hills, MI, United States of America
Accretech USA, Inc.
Calculating rank
% Expired Patents = 66.7
Forward Citations = 104
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15 inventors (with patents filed for the assignee):
Robert E Steere, Iii (3 out of 23 patents)
Michael D Robbins (2 out of 2 patents)
William Jefferson Stone, Iii (1 out of 2 patents)
4. Paul Forderhase (1 out of 8 patents)
5. Satish Sadam (1 out of 13 patents)
6. Vladimir Volovich (1 out of 4 patents)
7. Edmond Arzumau Abrahamians (1 out of 3 patents)
8. Ju Jin (1 out of 2 patents)
9. Colby Steere (1 out of 2 patents)
10. Siming Lin (1 out of 7 patents)
11. Vishal Verma (1 out of 1 patent)
12. Zhiyan Huang (1 out of 1 patent)
13. Igor Kravtsov (1 out of 1 patent)
14. Herbert Wayne Owens, Jr (1 out of 1 patent)
15. Yakov Keyfes (1 out of 1 patent)
6 patents:
Company Overview
Accretech Usa, Inc. is a leading provider of semiconductor equipment, specializing in precision measurement and inspection solutions for the semiconductor industry. With a commitment to innovation and quality, Accretech USA, Inc. delivers cutting-edge technology and services to help customers achieve their production goals. Leveraging decades of experience, the company offers a wide range of products and services tailored to meet the specific needs of the semiconductor market.
Profile summary synthesized from public USPTO records and patent filings.
IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Accretech USA, Inc.. Retrieved from https://idiyas.com/company/accretech-usa
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]