Company Filing History:
Years Active: 2002-2010
Title: Colby Steere: Innovator in Lithography and Wafer Measurement Technologies
Introduction
Colby Steere is a notable inventor based in Parsippany, NJ (US), recognized for her contributions to the fields of lithography and wafer measurement technologies. With a total of two patents to her name, she has made significant advancements that enhance manufacturing processes in the semiconductor industry.
Latest Patents
Colby Steere's latest patents include an "Apparatus for double-sided imprint lithography" and a "Method for measuring wafer thickness." The apparatus for double-sided imprint lithography features a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements. This innovative design allows for the simultaneous imprinting of opposing surfaces of the substrate using fluid pressure imprint lithography. The method for measuring wafer thickness involves a wafer edge grinding or polishing machine equipped with a pair of chucks and a movable sensor. This setup enables precise measurements of wafer thickness by comparing standard and actual measurement values.
Career Highlights
Throughout her career, Colby has worked with prominent companies such as Accretech USA, Inc. and Nanonex Corporation. Her experience in these organizations has contributed to her expertise in developing cutting-edge technologies in her field.
Collaborations
Colby has collaborated with notable individuals, including Robert E. Steere, III and Stephen Y. Chou. These partnerships have likely fostered innovation and creativity in her projects.
Conclusion
Colby Steere's work exemplifies the spirit of innovation in the semiconductor industry. Her patents reflect her commitment to advancing technology and improving manufacturing processes.