The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Aug. 13, 2004
Stephen Chou, Princeton, NJ (US);
Linshu Kong, Plainsboro, NJ (US);
Colby Steere, Parsippany, NJ (US);
Mingtao (Gary) LI, Boise, ID (US);
Hua Tan, South Bound Brook, NJ (US);
Lin HU, Livingston, NJ (US);
Stephen Chou, Princeton, NJ (US);
Linshu Kong, Plainsboro, NJ (US);
Colby Steere, Parsippany, NJ (US);
Mingtao (Gary) Li, Boise, ID (US);
Hua Tan, South Bound Brook, NJ (US);
Lin Hu, Livingston, NJ (US);
Nanonex Corp., Princeton, NJ (US);
Abstract
Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.