Company Filing History:
Years Active: 2010
Title: Celebrating Innovation: The Contributions of Mingtao (Gary) Li
Introduction: Mingtao (Gary) Li is an inventive force based in Boise, Idaho, recognized for his significant contributions to the field of imprint lithography. With a patented innovation to his name, he has made strides in enhancing manufacturing processes that require extreme precision.
Latest Patents: Li's notable patent, titled "Apparatus for double-sided imprint lithography," is instrumental in the advancement of high-precision lithography techniques. The invention describes an apparatus that involves a pair of correspondingly apertured molds and a support structure for a substrate assembly. Central to this invention is an alignment mechanism featuring radially movable elements designed to ensure accurate alignment of the molds with the substrate's apertures. By employing a conically tapered drive rod, these elements can be maneuvered radially outward, allowing both opposing surfaces of the substrate to be imprinted simultaneously, preferably using fluid pressure imprint lithography.
Career Highlights: Mingtao (Gary) Li is currently affiliated with Nanonex Corporation, a company recognized for its pioneering work in advanced nano-manufacturing technologies. His role at Nanonex Corporation allows him to collaborate on forward-thinking projects that push the boundaries of existing technology.
Collaborations: Throughout his career, Li has had the privilege of working alongside distinguished colleagues such as Stephen Y Chou and Linshu Kong. Together, they contribute to a vibrant exchange of ideas and innovations that enhance the company's portfolio and the wider field of imprint lithography.
Conclusion: Mingtao (Gary) Li stands out as a notable inventor whose work exemplifies the spirit of innovation. His patented technology represents a vital advancement in imprint lithography, showcasing his commitment to improving manufacturing techniques and contributing to the evolution of the industry. As he continues to innovate at Nanonex Corporation, the impact of his work is sure to resonate in the years to come.