Princeton Junction, NJ, United States of America

Hua Tan

This inventor holds 31 USPTO granted patents and 9 published patent applications, primarily in Imprint Lithography. Top assignees: Essenlix Corporation, Nanonex Corporation, Princeton University. Active years: 2006-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hua Tan. Retrieved from https://idiyas.com/inventor/hua-tan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 31 

% Patents Active = 93.5

Average Co-Inventor Count = 4.0

ph-index = 6

Forward Citations = 121(Granted Patents)


Location History:

  • Plainsboro, NJ (US) (2006)
  • Princeton, NJ (US) (2008 - 2009)
  • South Bound Brook, NJ (US) (2008 - 2010)
  • Princeton Junction, NJ (US) (2011 - 2024)

Company Filing History:


Years Active: 2006-2025

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Areas of Expertise:
Imprint Lithography
Temperature Control
Sample Manipulation
Assay Technology
Nanoimprinting
Mold Separation
Surface Coating
Laser Technology
Resonant Grating
Assay Plate
Deformable Mold
Hinge Design
31 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hua Tan

Introduction: Hua Tan, a pioneering inventor based in Princeton Junction, NJ, is known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hua Tan holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing her diverse range of expertise and innovative spirit.

Career Highlights: With a career spanning over two decades, Hua Tan has worked with leading tech companies and research institutions, spearheading projects that have revolutionized various industries.

Collaborations: Throughout her career, Hua Tan has collaborated with top scientists, engineers, and researchers from around the world, fostering a culture of innovation and knowledge-sharing.

Conclusion: Hua Tan's relentless pursuit of innovation and her passion for pushing the boundaries of technology continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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