Company Filing History:
Years Active: 2008-2012
Title: Linshu Kong: Innovator in Imprint Lithography
Introduction
Linshu Kong is a notable inventor based in Plainsboro, NJ (US), recognized for his contributions to the field of imprint lithography. He holds three patents that showcase his innovative approaches to enhancing the efficiency and effectiveness of imprinting processes.
Latest Patents
One of Linshu Kong's latest patents is a method and apparatus to apply surface release coating for imprint mold. This invention addresses the challenges of non-sticking separation in imprint lithography by ensuring that the mold is cleaned and coated in an evacuable chamber without relocation or time delays. The apparatus includes a support chuck, a surface cleaner unit, a heating source, and sensors to measure chamber conditions. Another significant patent is the apparatus for double-sided imprint lithography, which features a pair of correspondingly apertured molds and an alignment mechanism that allows for simultaneous imprinting of opposing surfaces of a substrate.
Career Highlights
Linshu Kong has made significant strides in his career at Nanonex Corporation, where he has applied his expertise in imprint lithography to develop advanced technologies. His work has contributed to the evolution of imprinting techniques, making them more efficient and reliable.
Collaborations
Linshu has collaborated with esteemed colleagues such as Hua Tan and Stephen Y Chou, further enhancing the innovative capabilities within his field.
Conclusion
Linshu Kong's work in imprint lithography exemplifies the spirit of innovation and dedication to advancing technology. His patents reflect a commitment to improving manufacturing processes and contribute to the ongoing evolution of the industry.