The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Aug. 25, 2004
Hua Tan, South Bound Brook, NJ (US);
Linshu Kong, Plainsboro, NJ (US);
Mingtao LI, Boise, ID (US);
Stephen Y. Chou, Princeton, NJ (US);
Hua Tan, South Bound Brook, NJ (US);
Linshu Kong, Plainsboro, NJ (US);
Mingtao Li, Boise, ID (US);
Stephen Y. Chou, Princeton, NJ (US);
Nanonex Corporation, Princeton, NJ (US);
Abstract
Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.