The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Oct. 18, 2013
Kla-tencor Corporation, Milpitas, CA (US);
Amnon Manassen, Haifa, IL;
Ohad Bachar, Timrat, IL;
Daria Negri, Nesher, IL;
Boris Golovanevsky, Haifa, IL;
Barak Bringoltz, Rishon Le Tzion, IL;
Daniel Kandel, Aseret, IL;
Yoel Feler, Haifa, IL;
Noam Sapiens, Bat Yam, IL;
Paykin Irina, Haifa, IL;
Alexander Svizher, Haifa, IL;
Meir Aloni, Herzliya, IL;
Guy Ben Dov, Haifa, IL;
Hadar Shalmoni, Beit Oved, IL;
Vladimir Levinski, Migdal HaEmek, IL;
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.