Hertslia, Israel

Meir Aloni


Average Co-Inventor Count = 5.3

ph-index = 8

Forward Citations = 336(Granted Patents)


Location History:

  • Herzelia, IL (2002)
  • Hertslia, IL (2006 - 2010)
  • Hertzlia, IL (2010)
  • Herzliya, IL (1996 - 2020)

Company Filing History:


Years Active: 1996-2020

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15 patents (USPTO):Explore Patents

Title: Meir Aloni: Innovator in Metrology

Introduction

Meir Aloni is a prominent inventor based in Herzliya, Israel, known for his significant contributions to the field of metrology. With a total of 15 patents to his name, Aloni has made remarkable advancements in the design and implementation of metrology methods and systems.

Latest Patents

One of Aloni's latest patents focuses on symmetric target design in scatterometry overlay metrology. This innovation provides metrology methods, systems, and targets that implement a side-by-side paradigm. Adjacent cells with periodic structures are utilized to extract overlay errors by introducing controllable phase shifts or image shifts. This enables algorithmic computation of the overlay. The periodic structures are specifically designed to exhibit rotational symmetry, which supports the computation and reduces errors.

Career Highlights

Throughout his career, Meir Aloni has worked with notable companies such as Orbot Instruments Ltd. and Applied Materials Israel Limited. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in metrology.

Collaborations

Aloni has collaborated with talented individuals in his field, including Gilad Almogy and Yair Eran. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Meir Aloni's work in metrology, particularly in symmetric target design, showcases his innovative spirit and dedication to advancing technology. His contributions have had a lasting impact on the field, and his patents continue to influence future developments.

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