The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2020

Filed:

Apr. 06, 2016
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Barak Bringoltz, Rishon le Tzion, IL;

Daniel Kandel, Aseret, IL;

Yoel Feler, Haifa, IL;

Noam Sapiens, Bat Yam, IL;

Paykin Irina, Haifa, IL;

Alexander Svizher, Haifa, IL;

Meir Aloni, Herzliya, IL;

Guy Ben Dov, Haifa, IL;

Hadar Shalmoni, Beit Oved, IL;

Vladimir Levinski, Migdal Ha'emek, IL;

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/27 (2006.01); G01N 21/01 (2006.01); G03F 7/20 (2006.01); G02B 27/42 (2006.01); G01N 21/47 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01N 21/01 (2013.01); G01B 11/272 (2013.01); G02B 27/4255 (2013.01); G02B 27/4272 (2013.01); G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); G01N 21/4788 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G01N 2201/068 (2013.01);
Abstract

Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.


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